AuthorGrogan, Daniel Francis.
AdvisorMacleod, H. Angus
MetadataShow full item record
PublisherThe University of Arizona.
RightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
AbstractEmerging deposition technologies now permit the nucleation and growth of diamond films on a variety of substrates, bestowing on them the extraordinary mechanical, chemical, thermal, and electrical properties of diamond. However, the diamond films invariably suffer from great surface roughness and attendant optical scatter which preclude their use in most optical applications. To be useful optically, these films must be polished. In this work, diamond films deposited by microwave-assisted chemical vapor deposition on silicon substrates have been polished by a beam of 500 eV oxygen ions with the use of spin-coated planarizing overcoat. The overcoat was developed to have the same ion-beam etch rate as the diamond films at the planarizing angle. The films' surface roughness was reduced from in excess of 1 μm (rms) and 6 μm (peak-to-valley), to 35 nm (rms) and 217 nm (peak-to valley). The polished films retained their diamond character and surface contamination was not detected. This polishing process makes optical applications in the near-infrared realizable for these diamond films.
Degree ProgramOptical Sciences