• Login
    View Item 
    •   Home
    • UA Graduate and Undergraduate Research
    • UA Theses and Dissertations
    • Dissertations
    • View Item
    •   Home
    • UA Graduate and Undergraduate Research
    • UA Theses and Dissertations
    • Dissertations
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.

    Browse

    All of UA Campus RepositoryCommunitiesTitleAuthorsIssue DateSubmit DateSubjectsPublisherJournalThis CollectionTitleAuthorsIssue DateSubmit DateSubjectsPublisherJournal

    My Account

    LoginRegister

    About

    AboutUA Faculty PublicationsUA DissertationsUA Master's ThesesUA Honors ThesesUA PressUA YearbooksUA CatalogsUA Libraries

    Statistics

    Most Popular ItemsStatistics by CountryMost Popular Authors

    Gas Phase Etching of Silicon Dioxide Films

    • CSV
    • RefMan
    • EndNote
    • BibTex
    • RefWorks
    Thumbnail
    Name:
    azu_etd_1453_sip1_m.pdf
    Size:
    26.69Mb
    Format:
    PDF
    Description:
    azu_etd_1453_sip1_m.pdf
    Download
    Author
    Montano, Gerardo
    Issue Date
    2006
    Keywords
    Data Acquisition and Control
    Silicon dioxide
    Etching
    HF
    H2O
    Surface Phenomena
    Advisor
    Muscat, Anthony J.
    Committee Chair
    Muscat, Anthony J.
    
    Metadata
    Show full item record
    Publisher
    The University of Arizona.
    Rights
    Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
    Abstract
    The gas phase etching of thermal silicon dioxide films was investigated with in situ Fourier Transformed Infrared Spectroscopy (FTIR) and ex situ X-ray Photoelectron Spectroscopy (XPS). The initiation process, the bulk etching of the oxide, and the termination mechanism were characterized as a function of reactant concentration, temperature, and pressure. The experiments were carried out in a custom made vessel with a gas panel and a data acquisition and control system (DA&C) capable of lowering flow and pressure disturbances originated by reactant introduction. The FTIR technique used to monitor the reaction in real time allowed distinguishing reactions that initiated in a gas/solid regime from reactions that started in a gas/liquid/solid regime. This study was focused on the gas/solid initiation process in order to expand the general assumption in published works that a condensed layer is previously required to initiate and sustain the reaction. It was found in this investigation that, depending on the experimental parameters, the water layer is not always a requisite for the initiation of the reaction but a consequence of the etching process. The FTIR data also showed the role in the initiation process of gas phase heterogeneous associated species, specifically (HF)H₂O and (HF)₂H₂O. After the initiation period, the experimental conditions determined the amount of water present on the surface of the sample, which in turn determined the local environment of the reaction and by extension the etching species. Reactions developing in a gas/solid regime were found to be slow, with etching rates of less than 1 °A/sec. Contrarily, reactions taking place in a gas/liquid/solid regime reached etching rates of 100 °A/sec, a maximum value determined by transport limitations. The condensed layer was found to be especially sensitive to temperature since a variation of 15 ° C changed the local environment from gas/liquid/solid to gas/solid. Finally, it was corroborated through the XPS analysis that the removal process in the gas phase leaves the silicon surfaces with high fluorine and oxygen concentrations in the form of SiFₓ and SiOH.
    Type
    text
    Electronic Dissertation
    Degree Name
    PhD
    Degree Level
    doctoral
    Degree Program
    Chemical Engineering
    Graduate College
    Degree Grantor
    University of Arizona
    Collections
    Dissertations

    entitlement

     
    The University of Arizona Libraries | 1510 E. University Blvd. | Tucson, AZ 85721-0055
    Tel 520-621-6442 | repository@u.library.arizona.edu
    DSpace software copyright © 2002-2017  DuraSpace
    Quick Guide | Contact Us | Send Feedback
    Open Repository is a service operated by 
    Atmire NV
     

    Export search results

    The export option will allow you to export the current search results of the entered query to a file. Different formats are available for download. To export the items, click on the button corresponding with the preferred download format.

    By default, clicking on the export buttons will result in a download of the allowed maximum amount of items.

    To select a subset of the search results, click "Selective Export" button and make a selection of the items you want to export. The amount of items that can be exported at once is similarly restricted as the full export.

    After making a selection, click one of the export format buttons. The amount of items that will be exported is indicated in the bubble next to export format.