DESIGN, FABRICATION AND CHARACTERISTICS OF THE N-WELL CMOS PROCESS.
Author
Hsieh, Jaw-Haw.Issue Date
1983Keywords
Metal oxide semiconductors, Complementary.Metal oxide semiconductors, Complementary -- Mathematical models.
Metal oxide semiconductors, Complementary -- Data processing.
Metadata
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The University of Arizona.Rights
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.Type
textThesis-Reproduction (electronic)
Degree Name
M.S.Degree Level
mastersDegree Program
Graduate CollegeElectrical and Computer Engineering