The design and development of an atmospheric and vacuum rotating wafer scanner
AuthorKalafatis, Stavros, 1965-
AdvisorO'Hanlon, John F.
MetadataShow full item record
PublisherThe University of Arizona.
RightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
AbstractA rotating wafer scanner was designed and developed in order to determine its operational feasibility and advantages over a linear wafer scanner. The scanner was first designed to operate at atmosphere. Each of its constituent parts were independently tested and when the final system was evaluated a 0.2 mum detection limit was observed. The latter result prompted the design and development of a vacuum rotating wafer scanner. The data obtained during the design and evaluation of the constituent parts of the latter system showed that particle detection in a vacuum is feasible.
Degree ProgramGraduate College
Electrical and Computer Engineering