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dc.contributor.advisorSchrimpf, Ronald D.en_US
dc.contributor.authorHasan, Samil Mukhlisin Yauma, 1967-
dc.creatorHasan, Samil Mukhlisin Yauma, 1967-en_US
dc.date.accessioned2013-04-03T13:21:49Z
dc.date.available2013-04-03T13:21:49Z
dc.date.issued1993en_US
dc.identifier.urihttp://hdl.handle.net/10150/278361
dc.description.abstractThe effect of neutron irradiation on power metal-oxide-semiconductor field effect transistors (power MOSFETs) breakdown voltage has been investigated. Power MOSFETs of both n- and p-channel with manufacturer's rated breakdown voltage between 100 to 500V were radiated up to accumulated neutron fluence of 5x10¹⁴ neutron/cm² Considerable increase in the breakdown voltages were observed in n-type MOSFETs after 10¹³ neutron/cm² and to p-type MOSFETs after 10¹² neutron/cm² The increase in breakdown voltages is due to the decrease in the mean free path caused by the neutron-irradiation-induced defects. The effect of positive trapped charge oxide and the termination structure to the breakdown voltage were considered. S-PISCES 2B device simulation was used to investigate the change in the b coefficient of Chynoweth's law that relates to the mean free path. Two empirical models are presented: one predicts the power MOSFET breakdown voltage after a certain amount of neutron fluence and the other considers the change in the b coefficient after some amount of neutron radiation to predict the change of breakdown voltage in a device simulation.
dc.language.isoen_USen_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.subjectEngineering, Electronics and Electrical.en_US
dc.titleNeutron irradiation effects on the breakdown voltage of power MOSFETsen_US
dc.typetexten_US
dc.typeThesis-Reproduction (electronic)en_US
thesis.degree.grantorUniversity of Arizonaen_US
thesis.degree.levelmastersen_US
dc.identifier.proquest1353683en_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.nameM.S.en_US
dc.identifier.bibrecord.b29225565en_US
refterms.dateFOA2018-06-16T22:58:17Z
html.description.abstractThe effect of neutron irradiation on power metal-oxide-semiconductor field effect transistors (power MOSFETs) breakdown voltage has been investigated. Power MOSFETs of both n- and p-channel with manufacturer's rated breakdown voltage between 100 to 500V were radiated up to accumulated neutron fluence of 5x10¹⁴ neutron/cm² Considerable increase in the breakdown voltages were observed in n-type MOSFETs after 10¹³ neutron/cm² and to p-type MOSFETs after 10¹² neutron/cm² The increase in breakdown voltages is due to the decrease in the mean free path caused by the neutron-irradiation-induced defects. The effect of positive trapped charge oxide and the termination structure to the breakdown voltage were considered. S-PISCES 2B device simulation was used to investigate the change in the b coefficient of Chynoweth's law that relates to the mean free path. Two empirical models are presented: one predicts the power MOSFET breakdown voltage after a certain amount of neutron fluence and the other considers the change in the b coefficient after some amount of neutron radiation to predict the change of breakdown voltage in a device simulation.


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