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dc.contributor.advisorCronin, John P.en_US
dc.contributor.advisorZelinski, Brian J. J.en_US
dc.contributor.authorKennedy, Steven Roger, 1971-
dc.creatorKennedy, Steven Roger, 1971-en_US
dc.date.accessioned2013-04-03T13:28:56Z
dc.date.available2013-04-03T13:28:56Z
dc.date.issued1996en_US
dc.identifier.urihttp://hdl.handle.net/10150/278554
dc.description.abstractIn this work a new wet-chemical method of preparing tungsten oxide thin films is described. This involves the dissolution of tungsten metal in aqueous hydrogen peroxide and reaction with acetic acid to form an alcohol-soluble precursor. All synthesis stages of this new precursor, termed peroxotungstic ethoxide, are characterized to determine possible reactions. The chemical and microstructural evolution of films is described as a function of firing temperature, utilizing infrared spectroscopy, diffraction and other optical data. A novel method of increasing the crack-free thickness of the films is given: a combination of oxalic acid dihydrate as a solution additive and film firing under controlled humidity. With this combination, fired crack-free films up to one micron in thickness were prepared. Oxalic acid dihydrate roughened and also caused crystallization of these films at lower temperatures (250°C) than expected. These rougher films exhibited an improved electrochromic response, as measured by optical and electrochemical characterizations.
dc.language.isoen_USen_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.subjectEngineering, Materials Science.en_US
dc.titleSynthesis, characterization and use of peroxotungstic ethoxide as a precursor to wet-chemically derived tungsten oxide thin filmsen_US
dc.typetexten_US
dc.typeThesis-Reproduction (electronic)en_US
thesis.degree.grantorUniversity of Arizonaen_US
thesis.degree.levelmastersen_US
dc.identifier.proquest1381795en_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.disciplineMaterials Science and Engineeringen_US
thesis.degree.nameM.Sc.en_US
dc.identifier.bibrecord.b34309706en_US
refterms.dateFOA2018-06-12T05:43:11Z
html.description.abstractIn this work a new wet-chemical method of preparing tungsten oxide thin films is described. This involves the dissolution of tungsten metal in aqueous hydrogen peroxide and reaction with acetic acid to form an alcohol-soluble precursor. All synthesis stages of this new precursor, termed peroxotungstic ethoxide, are characterized to determine possible reactions. The chemical and microstructural evolution of films is described as a function of firing temperature, utilizing infrared spectroscopy, diffraction and other optical data. A novel method of increasing the crack-free thickness of the films is given: a combination of oxalic acid dihydrate as a solution additive and film firing under controlled humidity. With this combination, fired crack-free films up to one micron in thickness were prepared. Oxalic acid dihydrate roughened and also caused crystallization of these films at lower temperatures (250°C) than expected. These rougher films exhibited an improved electrochromic response, as measured by optical and electrochemical characterizations.


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