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dc.contributor.authorWilson, Raymond G., 1932-
dc.creatorWilson, Raymond G., 1932-en_US
dc.date.accessioned2013-05-09T11:10:47Z
dc.date.available2013-05-09T11:10:47Z
dc.date.issued1971en_US
dc.identifier.urihttp://hdl.handle.net/10150/290274
dc.language.isoen_USen_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.subjectSilica.en_US
dc.subjectSputtering (Physics)en_US
dc.subjectOptical materials.en_US
dc.subjectIon bombardment.en_US
dc.subjectGrinding and polishing.en_US
dc.titleIONIC POLISHING OF FUSED SILICA, 5-15 KEVen_US
dc.typetexten_US
dc.typeDissertation-Reproduction (electronic)en_US
dc.identifier.oclc27394807en_US
thesis.degree.grantorUniversity of Arizonaen_US
thesis.degree.leveldoctoralen_US
dc.identifier.proquest7125129en_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.disciplineOptical Sciencesen_US
thesis.degree.namePh.D.en_US
dc.identifier.bibrecord.b25395476en_US
refterms.dateFOA2018-06-16T04:41:40Z


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