Electrical characterization and plasma impedance measurements of a RF plasma etch system
AuthorRoth, Weston Charles, 1970-
AdvisorCarlile, Robert N.
MetadataShow full item record
PublisherThe University of Arizona.
RightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
AbstractA modified Tegal MCR-1 plasma etch system has been electrically characterized, and the plasma impedance has been measured at 13.56MHz. Important aspects of radio-frequency (RF) impedance measurements are addressed as they pertain to the measurement of the plasma impedance. These include: transmission line effects, magnitude and phase errors of the measurement probes, and the intrinsic impedance of the empty plasma chamber. Plasma harmonics are discussed, and a technique for measuring the plasma impedance at harmonic frequencies is presented. Transients in the plasma impedance are observed during the first 5 minutes after the plasma is initiated, and represent a decrease in the plasma impedance. Residual gas analysis (RGA) confirms the presence of H₂O in the plasma. The H₂O ion current measured by RGA shows a downward transient similar to the impedance transients, suggesting a possible relationship between H₂O and the impedance transients. A possible explanation for these impedance transients is presented.
Degree ProgramGraduate College
Electrical and Computer Engineering