Characterization of trapped particles in RF plasmas
| dc.contributor.advisor | Peterson, Thomas W. | en_US |
| dc.contributor.advisor | Sinclair, Jennifer L. | en_US |
| dc.contributor.author | Schabel, Michael Joseph, 1973- | |
| dc.creator | Schabel, Michael Joseph, 1973- | en_US |
| dc.date.accessioned | 2013-05-16T09:32:19Z | |
| dc.date.available | 2013-05-16T09:32:19Z | |
| dc.date.issued | 1997 | en_US |
| dc.identifier.uri | http://hdl.handle.net/10150/291600 | |
| dc.description.abstract | Particle contamination in plasma processing is a serious and challenging issue for the semiconductor industry. In this work, Laser Doppler Velocimetry, Laser Light Scattering, and Optical Emission Spectroscopy are used to elucidate the physical behavior of particles trapped in a plasma. Coulomb theory is used to describe the motion of particles. The theory agreed very well with experimental data and was explored to evaluate conditions for which particle agglomeration is likely. Finally, it was observed that particles may fall out of the particle trap during plasma ignition and subsequently contaminate the substrate. | |
| dc.language.iso | en_US | en_US |
| dc.publisher | The University of Arizona. | en_US |
| dc.rights | Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author. | en_US |
| dc.subject | Physics, Fluid and Plasma. | en_US |
| dc.subject | Engineering, Materials Science. | en_US |
| dc.title | Characterization of trapped particles in RF plasmas | en_US |
| dc.type | text | en_US |
| dc.type | Thesis-Reproduction (electronic) | en_US |
| thesis.degree.grantor | University of Arizona | en_US |
| thesis.degree.level | masters | en_US |
| dc.identifier.proquest | 1386622 | en_US |
| thesis.degree.discipline | Graduate College | en_US |
| thesis.degree.discipline | Materials Science and Engineering | en_US |
| thesis.degree.name | M.S. | en_US |
| dc.identifier.bibrecord | .b37541389 | en_US |
| refterms.dateFOA | 2018-08-30T01:01:32Z | |
| html.description.abstract | Particle contamination in plasma processing is a serious and challenging issue for the semiconductor industry. In this work, Laser Doppler Velocimetry, Laser Light Scattering, and Optical Emission Spectroscopy are used to elucidate the physical behavior of particles trapped in a plasma. Coulomb theory is used to describe the motion of particles. The theory agreed very well with experimental data and was explored to evaluate conditions for which particle agglomeration is likely. Finally, it was observed that particles may fall out of the particle trap during plasma ignition and subsequently contaminate the substrate. |
