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dc.contributor.authorShevlin, Craig Martin, 1943-
dc.creatorShevlin, Craig Martin, 1943-en_US
dc.date.accessioned2013-08-15T09:52:42Z
dc.date.available2013-08-15T09:52:42Z
dc.date.issued1978en_US
dc.identifier.urihttp://hdl.handle.net/10150/298441
dc.language.isoen_USen_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.subjectSemiconductor doping.en_US
dc.subjectIon implantation.en_US
dc.subjectSemiconductors -- Effect of radiation on.en_US
dc.titleAN ELECTRON MICROSCOPE INVESTIGATION OF ION-IMPLANTED SILICON CONTAINING PRE-INDUCED STACKING FAULTSen_US
dc.typetexten_US
dc.typeDissertation-Reproduction (electronic)en_US
dc.identifier.oclc6411083en_US
thesis.degree.grantorUniversity of Arizonaen_US
thesis.degree.leveldoctoralen_US
dc.identifier.proquest7906412en_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.disciplineMetallurgical Engineeringen_US
thesis.degree.namePh.D.en_US
dc.identifier.bibrecord.b12988510en_US
refterms.dateFOA2018-08-30T10:38:39Z


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