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dc.contributor.advisorMilster, Thomas D.en_US
dc.contributor.authorSierchio, Justin Marken_US
dc.creatorSierchio, Justin Marken_US
dc.date.accessioned2014-05-13T22:20:52Z
dc.date.available2014-05-13T22:20:52Z
dc.date.issued2014
dc.identifier.urihttp://hdl.handle.net/10150/316782
dc.description.abstractCurrent metrology methods involve technicians viewing through a microscope, increasing the time, cost, and error rate in inspection. Developing an automated inspection system eliminates these difficulties. Shown in this work is a laser scanning microscope (LSM) design for an opto-electronic detection system (OEDS), based upon the concept that intensity differences related to pattern defects can be obtained from reflections off fused silica samples coated with photoresist (PR) or Aluminum. Development of this system for data collection and processing is discussed. Results show that 2.1 μm resolution of these defects is obtainable. Preliminary results for larger-array patterns through stitching processes are also shown. The second part of this work uses the concept of phase contrast edge detection. Looking at non-metallized patterns, one can use the property that phase changes induced by a refractive-index sensitive material can be seen with a multi-cell array, rendering the image visible by comparing the respective phases. A variety of defects and samples are shown. Extrapolating results to larger arrays is also discussed. Latent imaging, or imaging without development, is also evaluated. Future work in the areas of system commercialization, sample storage, and other mass-printing techniques are discussed.
dc.language.isoen_USen
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.subjectdefect detectionen_US
dc.subjectinspectionen_US
dc.subjectphotoresisten_US
dc.subjectOptical Sciencesen_US
dc.subjectcentral apertureen_US
dc.titleDevelopment of Large Array Auto Write-Scan Photoresist Fabrication and Inspection Systemen_US
dc.typetexten
dc.typeElectronic Dissertationen
thesis.degree.grantorUniversity of Arizonaen_US
thesis.degree.leveldoctoralen_US
dc.contributor.committeememberMilster, Thomas D.en_US
dc.contributor.committeememberDallas, Williamen_US
dc.contributor.committeememberKupinski, Matthewen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.disciplineOptical Sciencesen_US
thesis.degree.namePh.D.en_US
refterms.dateFOA2018-08-30T18:30:27Z
html.description.abstractCurrent metrology methods involve technicians viewing through a microscope, increasing the time, cost, and error rate in inspection. Developing an automated inspection system eliminates these difficulties. Shown in this work is a laser scanning microscope (LSM) design for an opto-electronic detection system (OEDS), based upon the concept that intensity differences related to pattern defects can be obtained from reflections off fused silica samples coated with photoresist (PR) or Aluminum. Development of this system for data collection and processing is discussed. Results show that 2.1 μm resolution of these defects is obtainable. Preliminary results for larger-array patterns through stitching processes are also shown. The second part of this work uses the concept of phase contrast edge detection. Looking at non-metallized patterns, one can use the property that phase changes induced by a refractive-index sensitive material can be seen with a multi-cell array, rendering the image visible by comparing the respective phases. A variety of defects and samples are shown. Extrapolating results to larger arrays is also discussed. Latent imaging, or imaging without development, is also evaluated. Future work in the areas of system commercialization, sample storage, and other mass-printing techniques are discussed.


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