Optical properties of chemical vapor depositions of silicon oxynitride films

dc.contributor.author	Grahn, Norman Donald, 1940-
dc.creator	Grahn, Norman Donald, 1940-	en
dc.date.accessioned	2015-05-21T10:14:30Z	en
dc.date.available	2015-05-21T10:14:30Z	en
dc.date.issued	1974	en
dc.identifier.uri	http://hdl.handle.net/10150/554659	en
dc.language.iso	en_US	en
dc.publisher	The University of Arizona.	en
dc.rights	Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.	en
dc.subject	Thin films -- Optical properties.	en
dc.title	Optical properties of chemical vapor depositions of silicon oxynitride films	en
dc.type	text	en
dc.type	Thesis-Reproduction (electronic)	en
dc.identifier.oclc	28493328	en
thesis.degree.grantor	University of Arizona	en
thesis.degree.level	masters	en
thesis.degree.discipline	Electrical Engineering	en
thesis.degree.discipline	Graduate College	en
thesis.degree.name	M.S.	en
dc.description.note	This item was digitized from a paper original. If you need higher-resolution images for any content in this item, please contact us at repository@u.library.arizona.edu.	en
dc.identifier.bibrecord	.b2798221x	en
dc.identifier.callnumber	E9791 1974 162	en
dc.description.admin-note	Original file replaced with corrected file May 2023.
refterms.dateFOA	2018-06-24T02:03:36Z

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