Dual-mode snapshot interferometric system for on-machine metrology
Citation
Xiaobo Tian, Yu Zhang, Alexander Sohn, Oliver J. Spires, and Rongguang Liang "Dual-mode snapshot interferometric system for on-machine metrology," Optical Engineering 58(4), 044104 (30 April 2019). https://doi.org/10.1117/1.OE.58.4.044104Journal
OPTICAL ENGINEERINGRights
Copyright © 2019 SPIE.Collection Information
This item from the UA Faculty Publications collection is made available by the University of Arizona with support from the University of Arizona Libraries. If you have questions, please contact us at repository@u.library.arizona.edu.Abstract
For the first time, we present a dual-mode snapshot interferometric system for measuring both surface shape and surface roughness to meet the need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and interference microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interferograms simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine.ISSN
0091-3286Version
Final published versionSponsors
National Science Foundation (NSF) [1455630]; TRIF Space Exploration and Optical Sciences (SEOS), University of Arizona; Oculus VR LLCae974a485f413a2113503eed53cd6c53
10.1117/1.oe.58.4.044104