Dual-mode snapshot interferometric system for on-machine metrology
AffiliationUniv Arizona, Coll Opt Sci
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CitationXiaobo Tian, Yu Zhang, Alexander Sohn, Oliver J. Spires, and Rongguang Liang "Dual-mode snapshot interferometric system for on-machine metrology," Optical Engineering 58(4), 044104 (30 April 2019). https://doi.org/10.1117/1.OE.58.4.044104
RightsCopyright © 2019 SPIE.
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AbstractFor the first time, we present a dual-mode snapshot interferometric system for measuring both surface shape and surface roughness to meet the need for on-machine metrology in optical fabrication. Two different modes, interferometer mode and interference microscopy mode, are achieved using Linnik configuration. To realize snapshot measurement, a pixelated polarization camera is used to capture four phase-shifted interferograms simultaneously. We have demonstrated its performance for off-line metrology and on-machine metrology by mounting it on a diamond turning machine.
VersionFinal published version
SponsorsNational Science Foundation (NSF) ; TRIF Space Exploration and Optical Sciences (SEOS), University of Arizona; Oculus VR LLC