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dc.contributor.advisorMilster, Tom D.
dc.contributor.authorTakeuchi, Seiji
dc.creatorTakeuchi, Seiji
dc.date.accessioned2020-09-29T23:04:28Z
dc.date.available2020-09-29T23:04:28Z
dc.date.issued1999
dc.identifier.urihttp://hdl.handle.net/10150/647456
dc.description.abstractPhotoresist gratings are analyzed using ellipsometry. In the analysis, simulated experiments are performed using zeroth-order and higher-order effective medium theory (HEMT) and rigorous coupled wave analysis (RCWA). The analysis takes a close look at the amplitude and phase of individual polarization components that are not readily measured with an ellipsometer. The RCWA calculations reveal that gratings should not be treated as simple uniaxial birefringence media unless the period-to-wavelength ratio is very small. Typically, an application of HEMT causes 2% error for a period-to-wavelength ration of 0.1 in the filling factor measurement. Period-to-wavelength ratios greater than 0.1 exhibit larger errors.en_US
dc.language.isoen_USen_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.titleEllipsometry of Photoresist Gratingsen_US
dc.typetexten_US
dc.typeThesis-Reproduction (electronic)en_US
thesis.degree.grantorUniversity of Arizonaen_US
thesis.degree.levelmastersen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.disciplineOptical Sciencesen_US
thesis.degree.nameM.S.en_US
dc.description.noteThesis PDF provided by author, approved by Optical Sciences for addition to repository, Sept 2020.en_US
refterms.dateFOA2020-09-29T23:04:45Z


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