Model validation of phase-induced amplitude apodization complex mask coronagraph for LUVOIR-A in vacuum
Author
Sirbu, D.Marx, D.
Belikov, R.
Bendek, E.
Fogarty, K.W.
Kern, B.
Guyon, O.

Pluzhnyk, E.E.
Wilson, D.W.
Affiliation
University of ArizonaIssue Date
2021Keywords
Binary StarsHigh-Contrast Imaging
Multi-StarWavefront Control
Super-Nyquist Wavefront Control
Wavefront Control
WFIRST
Metadata
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SPIECitation
Sirbu, D., Marx, D., Belikov, R., Bendek, E., Fogarty, K. W., Kern, B., Guyon, O., Pluzhnyk, E. E., & Wilson, D. W. (2021). Model validation of phase-induced amplitude apodization complex mask coronagraph for LUVOIR-A in vacuum. Proceedings of SPIE - The International Society for Optical Engineering.Rights
Copyright © 2021 SPIE.Collection Information
This item from the UA Faculty Publications collection is made available by the University of Arizona with support from the University of Arizona Libraries. If you have questions, please contact us at repository@u.library.arizona.edu.Abstract
The Phase-Induced Amplitude Apodization Complex Mask Coronagraph (PIAACMC) is a coronagraph architecture for the next generation of large space telescopes optimized for habitable exoplanet imaging that can achieve attractive theoretical performance with high throughput at small inner working angles (IWA). PIAACMC designs are compatible with large, on-Axis, segmented apertures such as the Large UV / Optical/ Infrared A (LUVOIRA) concept currently being considered by the decadal survey review which would greatly enhance the possibility to achieve statistically significant scientific yields and signal quality for direct imaging exoplanet surveys. A PIAACMC design has been recently created for LUVOIR-A and is currently being tested in vacuum at JPL's High-Contrast Imaging Testbed (HCIT). In this work, we review the theoretical performance of the PIAACMC instrument designed to meet a 1e-9 raw contrast goal in 10% broadband light in a region from 2-8 λ/D both before and after the wavefront control loop. We use empirical measurements from the vacuum testbed to verify the instrument model and its performance including line-of-sight errors, instrument alignment, and fabricated components. In particular, the model verification includes measured sags of the manufactured PIAA mirrors by NuTek. The CMC mask was manufactured at JPL's Microdevices Laboratory and we include surface profile characterization measurement. We assess the impact on performance of the different manufacturing and alignment errors. © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.Note
Immediate accessISSN
0277-786XISBN
9781510644847Version
Final published versionae974a485f413a2113503eed53cd6c53
10.1117/12.2594901